A preliminary study of pure metal surfaces using Auger Electron Spectroscopy (AES), X-ray Photoelectron Spectroscopy (XPS) and Secondary Ion Mass Spectroscopy (SIMS)
1975; Elsevier BV; Volume: 53; Issue: 1 Linguagem: Inglês
10.1016/0039-6028(75)90160-0
ISSN1879-2758
Autores Tópico(s)Integrated Circuits and Semiconductor Failure Analysis
ResumoAbstract A system is described which incorporates Auger spectroscopy (AES), x-ray photoelectron spectroscopy (XPS) and secondary ion mass spectroscopy (SIMS) in one UHV chamber. The system has been used to determine sensitivity factors for XPS for a number of pure metals. These factors are then compared with ion yields from surfaces using SIMS. By performing similar XPS measurements in another, more conventional, system, comparison has been made of the electron transmissions of the double-pass cylindrical analyser in the XPS (retarding) mode and of the hemispherical analyser.
Referência(s)