Laser interference lithography for nanoscale structuring of materials: From laboratory to industry
2008; Elsevier BV; Volume: 86; Issue: 4-6 Linguagem: Inglês
10.1016/j.mee.2008.12.043
ISSN1873-5568
AutoresAinara Rodríguez, Mikel Echeverría, Miguel Ellman, N. Pérez, Yuri K. Verevkin, Changsi Peng, Thierry Berthou, Zuobin Wang, I. Ayerdi, Joan Savall, Santiago M. Olaizola,
Tópico(s)Photonic and Optical Devices
ResumoPeriodic structures are of increasing interest in many fields such as nanotechnology and biotechnology among others. Laser Interference Lithography (LIL) has been widely studied for the fabrication of periodic structures. However, a LIL tool for the nanoscale structuring of materials that can scale beyond laboratory prototypes into cost effective industrial processes is not yet defined. In this work, we describe a versatile and automatic high-power multiple beam interference lithography system design capable of overcoming the limitations of manual setups. Using this system, we have successfully processed photoresist samples on the whole surface of 3 in. silicon wafers, demonstrating the applicability of this prototype to a wide range of device fabrication.
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