Application of the Protection/Deprotection Strategy to the Science of Porous Materials
2011; Volume: 23; Issue: 25 Linguagem: Inglês
10.1002/adma.201100569
ISSN1521-4095
AutoresT. Frot, Willi Volksen, Sampath Purushothaman, Robert L. Bruce, Géraud Dubois,
Tópico(s)Nanofabrication and Lithography Techniques
ResumoAdvanced MaterialsVolume 23, Issue 25 p. 2828-2832 Communication Application of the Protection/Deprotection Strategy to the Science of Porous Materials Theo Frot, Theo Frot IBM Almaden Research Center, 650 Harry Road, San Jose, CA 95120, USASearch for more papers by this authorWilli Volksen, Willi Volksen IBM Almaden Research Center, 650 Harry Road, San Jose, CA 95120, USASearch for more papers by this authorSampath Purushothaman, Sampath Purushothaman IBM T.J. Watson Research Center, 1101 Kitchawan Rd, Rte 134, Yorktown Heights, NY 10598, USASearch for more papers by this authorRobert Bruce, Robert Bruce IBM T.J. Watson Research Center, 1101 Kitchawan Rd, Rte 134, Yorktown Heights, NY 10598, USASearch for more papers by this authorGeraud Dubois, Corresponding Author Geraud Dubois gdubois@us.ibm.com IBM Almaden Research Center, 650 Harry Road, San Jose, CA 95120, USAIBM Almaden Research Center, 650 Harry Road, San Jose, CA 95120, USA.Search for more papers by this author Theo Frot, Theo Frot IBM Almaden Research Center, 650 Harry Road, San Jose, CA 95120, USASearch for more papers by this authorWilli Volksen, Willi Volksen IBM Almaden Research Center, 650 Harry Road, San Jose, CA 95120, USASearch for more papers by this authorSampath Purushothaman, Sampath Purushothaman IBM T.J. Watson Research Center, 1101 Kitchawan Rd, Rte 134, Yorktown Heights, NY 10598, USASearch for more papers by this authorRobert Bruce, Robert Bruce IBM T.J. Watson Research Center, 1101 Kitchawan Rd, Rte 134, Yorktown Heights, NY 10598, USASearch for more papers by this authorGeraud Dubois, Corresponding Author Geraud Dubois gdubois@us.ibm.com IBM Almaden Research Center, 650 Harry Road, San Jose, CA 95120, USAIBM Almaden Research Center, 650 Harry Road, San Jose, CA 95120, USA.Search for more papers by this author First published: 29 April 2011 https://doi.org/10.1002/adma.201100569Citations: 62Read the full textAboutPDF ToolsRequest permissionExport citationAdd to favoritesTrack citation ShareShare Give accessShare full text accessShare full-text accessPlease review our Terms and Conditions of Use and check box below to share full-text version of article.I have read and accept the Wiley Online Library Terms and Conditions of UseShareable LinkUse the link below to share a full-text version of this article with your friends and colleagues. Learn more.Copy URL Share a linkShare onFacebookTwitterLinked InRedditWechat Abstract Selective protection of the porosity can be implemented in porous materials processing by using an organic polymer fill. This strategy is employed to protect ultralow-k (ULK) materials during patterning of 250-nm lines and spaces. Structures with significantly less sidewall and trench bottom damage are obtained, proving the potential of this novel approach in materials science. Citing Literature Volume23, Issue25July 5, 2011Pages 2828-2832 RelatedInformation
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