The growth and characteristics of CVD SiCTiC in-situ composites
1998; Elsevier BV; Volume: 24; Issue: 4 Linguagem: Inglês
10.1016/s0272-8842(97)00008-4
ISSN1873-3956
AutoresTain-tsair Lin, Jung‐Fang Chang, Min‐Hsiung Hon,
Tópico(s)Aluminum Alloys Composites Properties
ResumoSiCTiC in-situ composites have been synthesized by low pressure chemical vapour deposition on graphite with SiCl4, TiCl4 C3H8 and H2 reaction gases to improve the toughness of SiCTiC ceramics. The composite was deposited at various temperatures (1500~1600 °C), total pressure (40~300 torr) and reactant concentrations. The microstructure was investigated by scanning electron microscopy, optical microscopy and transmission electron microscopy. The morphologies of facet structure, nodular structure and dendrite structure appear depending on the experimental conditions. A dense SiCTiC deposit without porosity was obtained with a maximum growth rate of 1.6mm h−1 at C3H8 = 25 cm3 min−1 and 200 torr. Only β-SiC and TiC phases have been identified in the composite with a dramatic change of the composition at the interface of SiC and TiC grains. The fracture toughness (KIc) determined by the indentation method exhibits a value as high as 5.9 MPa m12 that could be obtained by deposition at low pressure and low C3H8 concentration. Cracks propagate with more deflection in the SiCTiC composites than in monolithic SiC. The result is due to existing severe strain at the SiCTiC interface observed by transmission electron microscopy.
Referência(s)