Range profiles of 6–16-keV hydrogen ions implanted in metal oxides
1976; American Institute of Physics; Volume: 47; Issue: 4 Linguagem: Inglês
10.1063/1.322791
ISSN1520-8850
AutoresJ. Bøttiger, J. R. Leslie, N. Rud,
Tópico(s)Nuclear materials and radiation effects
ResumoThe range profiles of 6–16-keV hydrogen ions implanted in the amorphous metal oxides Al2O3, Nb2O5, Ta2O5 have been measured. The profiles were determined by use of the nuclear reaction 1H(19F,αγ)16O. Good agreement with theoretical predictions is observed for the most probable ranges, while the widths of the experimental distributions are substantially larger than theoretically calculated for Al2O3 and Nb2O5.
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