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Influence of deposition atmosphere on photocatalytic activity of TiO2/SiOx double-layers prepared by RF magnetron sputtering

2009; Elsevier BV; Volume: 256; Issue: 1 Linguagem: Inglês

10.1016/j.apsusc.2009.05.059

1873-5584

Seung Gie Seong, Eui Jung Kim, Yong Soo Kim, Ka Eun Lee, Sung Hong Hahn,

Copper-based nanomaterials and applications

TiO2/SiOx double-layers have been prepared at room temperature by RF magnetron sputtering. The TiO2 top-layer was deposited in an Ar atmosphere, while the SiOx bottom-layer was deposited in an Ar/O2 atmosphere. Samples were characterized using X-ray photoelectron spectroscopy, scanning electron microscopy, atomic force microscopy, and photoluminescence techniques. The photocatalytic activity of the samples was evaluated by the photodegradation of methylene blue; the results showed that the photocatalytic activity of the TiO2/SiOx double-layers was superior to that of the TiO2 single-layers. The presence of the SiOx bottom-layer improved the photocatalytic activity of the TiO2 layer because it may act as a trap for electrons generated in the TiO2 layer thus preventing electron-hole recombinations.