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CD performance of a new high-resolution laser pattern generator

1999; SPIE; Volume: 3873; Linguagem: Inglês

10.1117/12.373335

1996-756X

Per Lidén, Tomas Vikholm, Lars Kjellberg, Måns Bjuggren, Klas Edgren, John-Oscar Larson, Steven Haddleton, P. Askebjer,

Advanced optical system design

CD uniformity is one of the most critical parameters for mask making today. The mask error factor (MEF) in lithography for features that are smaller than the stepper wavelength means that any CD error is transferred to the wafer to a greater extent than the stepper reduction factor would indicate. CD results form a new laser pattern generator, the Omega6000 product line, will be presented. The system features an acousto-optic deflection architecture specifically designed to meet the CD requirements of 180 nm photomasks. A 0.86 NA final lens provides the high resolution of the system. The CD control and the high resolution makes the system well suited for today's advanced photomasks.