Microwave plasma: its characteristics and applications in thin film technology
1986; Elsevier BV; Volume: 36; Issue: 1-3 Linguagem: Inglês
10.1016/0042-207x(86)90292-7
ISSN1879-2715
Autores Tópico(s)Copper Interconnects and Reliability
ResumoMicrowave plasmas differ significantly from other plasmas, exhibit many interesting properties and so offer new possibilities for the plasma processing of thin films. Plasma properties strongly depend on the conditions and methods used to excite the gas. Due to the existence of a direct connection between the properties of plasma-prepared thin films and plasma micro-parameters a perfect knowledge of the plasma generation is a basic requirement for mastering a plasma deposition process. Therefore, different methods of generating microwave isotropic and anisotropic plasmas are discussed. Special attention is devoted to the mechanisms of plasma excitation and to the generation of a dense and homogeneous plasma in large volumes. Some applications of microwave plasma in thin film technology are also presented.
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