Portal de Periódicos da CAPES

<title>Design and fabrication of a reflection far-ultraviolet polarizer and retarder</title>

1994; SPIE; Volume: 2010; Linguagem: Inglês

10.1117/12.168569

1996-756X

Jongmin Kim, Muamer Zukic, Michele M. Wilson, D. G. Torr,

Calibration and Measurement Techniques

New methods have been developed for the design of a far ultraviolet multilayer reflection polarizer and retarder. A MgF 2 /Al/MgF 2 three-layer structure deposited on a thick opaque Al film (substrate) is used for the design of polarizers and retarders. The induced transmission and absorption method is used for the design of a polarizer and layer-by-layer electric field calculation method is used for the design of a quarterwave retarder. In order to fabricate these designs in a conventional high vacuum chamber we have to minimize the oxidation of the Al layers and somehow characterize the oxidized layer. X-ray photoelectron spectroscopy is used to investigate the amount and profile of oxidation. Depth profiling results and a seven layer oxidation model are presented.