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Columnar structured amorphous carbon nitride films

2010; Wiley; Volume: 7; Issue: 3-4 Linguagem: Inglês

10.1002/pssc.200982676

1862-6351

Masami Aono, Shunsuke Kikuchi, Naoyuki Tamura, Nobuaki Kitazawa, Yoshihisa Watanabe, Shugo Nitta,

Plasma Diagnostics and Applications

Abstract Columnar structured amorphous carbon nitride films were deposited by reactive radio frequency magnetron sputtering from a graphite target in glow discharge plasma of nitrogen. The columnar structure was observed in all specimens of the amorphous carbon nitride (a‐CN x ) films deposited on substrates of crystalline Si and quartz glass within substrate temperatures between RT and 853 K in nitrogen gas pressure of 0.12 to 0.8 Torr. The average diameter of the columns obtained from SEM was found to be about 40 nm. The results of XRD and FE‐TEM confirmed the columns were amorphous materials. However, the electrical properties reflected clearly the heterogeneous structure of a‐CN x films, i.e., the resistivity in the vertical to a‐CN x columns was lower as compared with that in the horizontal direction (© 2010 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)