Effects of annealing and current stressing on the intermetallic compounds growth kinetics of Cu/thin Sn/Cu bump
2011; Elsevier BV; Volume: 89; Linguagem: Inglês
10.1016/j.mee.2011.04.025
ISSN1873-5568
AutoresMyeong-Hyeok Jeong, Jaewon Kim, Byung-Hyun Kwak, Young-Bae Park,
Tópico(s)Copper Interconnects and Reliability
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