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The mechanism of the photochemical degradation of poly(di-n-alkylsilanes) in solution

1989; American Chemical Society; Volume: 111; Issue: 3 Linguagem: Inglês

10.1021/ja00185a060

1943-2984

Takashi Karatsu, Robert D. Miller, Ratnasabapathy Sooriyakumaran, Josef Michl,

Silicone and Siloxane Chemistry

ADVERTISEMENT RETURN TO ISSUEPREVArticleNEXTThe mechanism of the photochemical degradation of poly(di-n-alkylsilanes) in solutionTakashi Karatsu, Robert D. Miller, Ratnasabapathy Sooriyakumaran, and Josef MichlCite this: J. Am. Chem. Soc. 1989, 111, 3, 1140–1141Publication Date (Print):February 1, 1989Publication History Published online1 May 2002Published inissue 1 February 1989https://pubs.acs.org/doi/10.1021/ja00185a060https://doi.org/10.1021/ja00185a060research-articleACS PublicationsRequest reuse permissionsArticle Views131Altmetric-Citations59LEARN ABOUT THESE METRICSArticle Views are the COUNTER-compliant sum of full text article downloads since November 2008 (both PDF and HTML) across all institutions and individuals. These metrics are regularly updated to reflect usage leading up to the last few days.Citations are the number of other articles citing this article, calculated by Crossref and updated daily. Find more information about Crossref citation counts.The Altmetric Attention Score is a quantitative measure of the attention that a research article has received online. Clicking on the donut icon will load a page at altmetric.com with additional details about the score and the social media presence for the given article. Find more information on the Altmetric Attention Score and how the score is calculated. Share Add toView InAdd Full Text with ReferenceAdd Description ExportRISCitationCitation and abstractCitation and referencesMore Options Share onFacebookTwitterWechatLinked InRedditEmail Other access optionsGet e-Alertsclose Get e-Alerts