Model for oxygen recombination on silicon-dioxide surfaces
1991; American Institute of Aeronautics and Astronautics; Volume: 5; Issue: 3 Linguagem: Inglês
10.2514/3.262
ISSN1533-6808
Autores Tópico(s)Silicone and Siloxane Chemistry
ResumoThis paper addresses the problem of modeling the catalytic recombination of oxygen on silicon dioxide, the principal material making up the Space Shuttle thermal protection tiles. A new mechanism involving the surface oxygen of the silicon-dioxide matrix itself is proposed. The detailed rate equations describing the proposed mechanism are written and solved at steady state. The predicted rates are shown to match catalytic data specifically collected for the silicon-dioxide/oxygen system.
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