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Applications of enhanced optical proximity correction models

1998; SPIE; Volume: 3334; Linguagem: Inglês

10.1117/12.310753

1996-756X

Jack Zhao, Joseph G. Garofalo, J. W. Blatchford, Edward Ehrlacher, Ellis Nease,

Optical Coatings and Gratings

The accurate prediction of relevant optical and other processing effects is the essential first element of optical proximity effect (OPC) methodologies. A quasi-empirical modeling technique has been devised. Starting from standard aerial-image energy deposition, an exponential transfer function is employed to account for saturation effects. This is then followed by a double-Gaussian diffusion convolution. Finally, a novel 2-dimensional log-slope model was devised to better predict some DUV processes. The model parameters are derived from a few empirical measurements and a fitting process. The calibrated model is then used by a rule-based OPC package to correct a variety of structures. Efficient verification techniques suitable for large area designs are introduced.