Preparation of intrinsic and N-doped p-type ZnO thin films by metalorganic vapor phase epitaxy
2005; American Institute of Physics; Volume: 87; Issue: 21 Linguagem: Inglês
10.1063/1.2132528
ISSN1520-8842
AutoresGuotong Du, Yan Ma, Yuantao Zhang, Tianpeng Yang,
Tópico(s)Copper-based nanomaterials and applications
ResumoThe intrinsic p-type ZnO thin films were prepared by controlling the oxygen partial pressure during growth. The E2 (high) mode at 432.2cm−1 appeared in the Raman spectrum of the film. The photoluminescence spectra taken at 77 K showed the emission band C in the violet region, which originated from zinc vacancy and varied in intensity in accordance with the quantity of the carrier concentration in the films. The N-doped p-type ZnO films were realized by N2 plasma. The Raman spectrum showed the dominant A1 (LO) mode at 580cm−1, that was the result of the host-lattice defects generated by N dopant rather than the N-related local vibration modes.
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