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Effect of directed (radial) gas flow on sputtering and emission characteristics in radio frequency powered glow discharge devices

1993; Elsevier BV; Volume: 48; Issue: 6-7 Linguagem: Inglês

10.1016/0584-8547(93)80090-h

1873-3565

Chris Lazik, R. Kenneth Marcus,

Mass Spectrometry Techniques and Applications

An assembly has been constructed for the radial introduction of Ar support gas toward the cathode surface of a radio frequency glow discharge atomic emission device. Studies of directed gas flow suggest two counteracting processes. At lower flow rates (< 300 mlmin), the gas has a sweeping effect to remove sputtered material from the region directly above the cathode surface, presumably inhibiting the redeposition process. At higher flow rates, a localized high-pressure region is established with a consequent lowering of the dc bias potential and resultant decrease in sputtering rates. Use of directed gas flow is found to increase the extent of self-absorption for low-lying atomic transitions, while ionic emission is found to be enhanced. The use of continuous, radial gas introduction allows for retention of desired sputter crater shapes.