Portal de Periódicos da CAPES

Oxide film growth on titaniumaluminum alloys at 165–270°C

1971; Elsevier BV; Volume: 8; Issue: 3 Linguagem: Inglês

10.1016/0025-5416(71)90055-3

1873-4928

Donald L. Johnson, N. M. Bashara, Luh C. Tao,

Semiconductor materials and devices

Abstract Measurements of in situ oxide film growth on polycrystalline titanium alloys in pure oxygen at one atmosphere pressure were made by the ellipsometric method. Alloys contained 0 to 23 wt.% aluminum and the test temperature range was 165° to 270°C. For the thin film region (less than 40 A at 330°C and 200 A at 550°C), the data follow the reciprocal logarithmic kinetics model.