Effect of Activation of Oxygen by Electron Cyclotron Resonance Plasma on the Incorporation of Pb in the Deposition of Pb(Zr,Ti)O 3 Films by DC Magnetron Reactive Sputtering
1997; Institute of Physics; Volume: 36; Issue: 9R Linguagem: Inglês
10.1143/jjap.36.5663
ISSN1347-4065
AutoresSung-Tae Kim Sung-Tae Kim, Hyunho Kim, Yong-Il Kim Yong-Il Kim, Moonyong Lee, Won-Jong Lee Won-Jong Lee,
Tópico(s)Microwave Dielectric Ceramics Synthesis
ResumoPb(Zr,Ti)O 3 films were deposited by DC magnetron reactive sputtering on Pt/Ti/SiO 2 /Si and Pt/SiO 2 /Si substrates. The activation of oxygen by electron cyclotron resonance (ECR) plasma facilitated the incorporation of Pb. This enabled the fabrication of Pb(Zr,Ti)O 3 films with stoichiometric composition and perovskite structure even at a high Zr/Ti film concentration ratio and high substrate temperature and on Pt/SiO 2 /Si substrates where the pyrochlore second phase was usually observed when the films were deposited without oxygen activation.
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