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Influence of Hydrogen Gas Dilution on the Properties of Silicon-Doped Thin Films Prepared by the Hot-Wire Plasma-Assisted Technique

2002; Trans Tech Publications; Volume: 230-232; Linguagem: Inglês

10.4028/www.scientific.net/kem.230-232.591

ISSN

1662-9809

Autores

I. Ferreira, Paula M. Vilarinho, Francisco Manuel Braz Fernandes, Elvira Fortunato, Rodrigo Martins,

Tópico(s)

Semiconductor materials and devices

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