Recent developments in dimensional nanometrology using AFMs
2011; IOP Publishing; Volume: 22; Issue: 12 Linguagem: Inglês
10.1088/0957-0233/22/12/122001
ISSN1361-6501
AutoresAndrew Yacoot, Ludger Koenders,
Tópico(s)Advanced Surface Polishing Techniques
ResumoScanning probe microscopes, in particular the atomic force microscope (AFM), have developed into sophisticated instruments that, throughout the world, are no longer used just for imaging, but for quantitative measurements. A role of the national measurement institutes has been to provide traceable metrology for these instruments. This paper presents a brief overview as to how this has been achieved, highlights the future requirements for metrology to support developments in AFM technology and describes work in progress to meet this need.
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