Electrodeposition of NiP amorphous alloys. A multilayer structure
1994; Elsevier BV; Volume: 248; Issue: 1 Linguagem: Inglês
10.1016/0040-6090(94)90210-0
ISSN1879-2731
AutoresJ. Crousier, Z. Hanane, J-P. Crousier,
Tópico(s)Semiconductor materials and interfaces
ResumoThe mechanism of NiP alloy electrodeposition was studied by linear-sweep voltammetry. The formation of two NiP alloys was evidenced by the anodic dissolution, which exhibited two peaks. The voltammogram indicated the presence of gaseous species, mostly hydrogen, trapped in the deposit. The occluded hydrogen was highlighted by other electrochemical transient methods. Bulk deposits were prepared and characterized by scanning electron microscopy (SEM) and energy-dispersive X-ray analysis. SEM confirms the layered structure of the deposit.
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