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Very high growth rate chemical vapor deposition of single-crystal diamond

2002; National Academy of Sciences; Volume: 99; Issue: 20 Linguagem: Inglês

10.1073/pnas.152464799

1091-6490

Chih‐shiue Yan, Yogesh K. Vohra, Ho‐kwang Mao, Russell J. Hemley,

High-pressure geophysics and materials

Diamond possesses extraordinary material properties, a result that has given rise to a broad range of scientific and technological applications. This study reports the successful production of high-quality single-crystal diamond with microwave plasma chemical vapor deposition (MPCVD) techniques. The diamond single crystals have smooth, transparent surfaces and other characteristics identical to that of high-pressure, high-temperature synthetic diamond. In addition, the crystals can be produced at growth rates from 50 to 150 mum/h, which is up to 2 orders of magnitude higher than standard processes for making polycrystalline MPCVD diamond. This high-quality single-crystal MPCVD diamond may find numerous applications in electronic devices as high-strength windows and in a new generation of high-pressure instruments requiring large single-crystal anvils.