XPS study of an ion sputtering process of fluoropolymers using Monte Carlo simulation
1987; American Chemical Society; Volume: 20; Issue: 2 Linguagem: Inglês
10.1021/ma00168a029
ISSN1520-5835
AutoresTakayuki Takahagi, Akihiko Ishitani,
Tópico(s)Electron and X-Ray Spectroscopy Techniques
ResumoADVERTISEMENT RETURN TO ISSUEPREVArticleNEXTXPS study of an ion sputtering process of fluoropolymers using Monte Carlo simulationT. Takahagi and A. IshitaniCite this: Macromolecules 1987, 20, 2, 404–407Publication Date (Print):February 1, 1987Publication History Published online1 May 2002Published inissue 1 February 1987https://pubs.acs.org/doi/10.1021/ma00168a029https://doi.org/10.1021/ma00168a029research-articleACS PublicationsRequest reuse permissionsArticle Views257Altmetric-Citations17LEARN ABOUT THESE METRICSArticle Views are the COUNTER-compliant sum of full text article downloads since November 2008 (both PDF and HTML) across all institutions and individuals. These metrics are regularly updated to reflect usage leading up to the last few days.Citations are the number of other articles citing this article, calculated by Crossref and updated daily. Find more information about Crossref citation counts.The Altmetric Attention Score is a quantitative measure of the attention that a research article has received online. Clicking on the donut icon will load a page at altmetric.com with additional details about the score and the social media presence for the given article. Find more information on the Altmetric Attention Score and how the score is calculated. Share Add toView InAdd Full Text with ReferenceAdd Description ExportRISCitationCitation and abstractCitation and referencesMore Options Share onFacebookTwitterWechatLinked InRedditEmail Other access optionsGet e-Alertsclose Get e-Alerts
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