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SmFe12 and SmFe12Nx films fabricated by sputtering

1993; Elsevier BV; Volume: 124; Issue: 1-2 Linguagem: Inglês

10.1016/0304-8853(93)90070-i

1873-4766

D. Wang, S. H. Liou, Peigang He, D. J. Sellmyer, G. C. Hadjipanayis, Y. Zhang,

Magnetic Properties and Applications

DC magnetron sputtering has been used to fabricate SmFe12 films with ThMn12 type of tetragonal structure. SmFe12Nx films were made by heating the sample in situ in a low pressure nitrogen atmosphere. The lattice parameters are a = 8.589 Å, C = 4.807 Å for SmFe12 films and a = 8.735 Å, c = 4.895 Å for SmFe12Nx films respectively, corr esponding to a volume increase of about 5.3% upon nitrogenation. A change of anisotropy and an increase of Curie temperature upon nitrogenation are observed. Aspects of crystal structure, texture and magnetic properties are reported.