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Characterization of focused ion beam micromachined features

1989; AIP Publishing; Volume: 7; Issue: 6 Linguagem: Inglês

10.1116/1.584463

2327-9877

J. G. Pellerin, G. M. Shedd, D. P. Griffis, P. E. Russell,

Advancements in Photolithography Techniques

The use of the liquid metal ion source focused ion beam (FIB) as a microfabrication tool depends, to a large extent, on the understanding of ion beam/substrate interactions. In addition to material removal and redeposition, the alteration of the underlying substrate by the ion beam can affect the performance and characteristics of semiconductor microelectronic and optoelectronic devices, and the physical properties of micromechanical components. Chemical modification to FIB machined substrates has been investigated by energy dispersive x-ray spectroscopy (EDS) and Auger electron spectroscopy (AES). EDS has proven useful for determining the residual implanted ion dose in micromachined features with good correlation to theoretical values. AES has been used to observe the lateral and depth distribution of the implanted ion species in the machined features and surrounding areas.