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Polybenzoxazine as a Mold-Release Agent for Nanoimprint Lithography

2007; American Chemical Society; Volume: 23; Issue: 11 Linguagem: Inglês

10.1021/la062921e

1520-5827

Chih‐Feng Wang, Shih-Feng Chiou, Fu‐Hsiang Ko, Jem-Kun Chen, Cheng-Tung Chou, Chih‐Feng Huang, Shiao‐Wei Kuo, Feng-Chih Chang,

Injection Molding Process and Properties

One of the most important tasks remaining to be resolved in nanoimprint lithography is the elimination of the resist sticking to the mold during demolding. Previously, the main approach was to apply a thin layer of fluorinated alkyl silane mold-release agent on the surface on the mold; however, this involves complicated steps and high costs. The low surface free energy material polybenzoxazine provides an efficient mold-release agent for silicon molds that is easier to process, costs less, and has no side reactions.