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High fidelity blazed grating replication using nanoimprint lithography

2004; American Institute of Physics; Volume: 22; Issue: 6 Linguagem: Inglês

10.1116/1.1809614

1520-8567

Chih‐Hao Chang, Juan Montoya, Mireille Akilian, Andrew Lapsa, Ralf K. Heilmann, Mark L. Schattenburg, M. Li, Kathryn A. Flanagan, Andrew P. Rasmussen, J. F. Seely, J. M. Laming, Benjawan Kjornrattanawanich, Leonid I. Goray,

Advanced Surface Polishing Techniques

We report progress in using nanoimprint lithography to fabricate high fidelity blazed diffraction gratings. Anisotropically etched silicon gratings with 200nm period and 7.5° blaze angle were successfully replicated onto 100mm diameter wafers with subnanometer roughness and excellent profile conformity. Out-of-plane distortion induced by residual stress from polymer films was also analyzed and found to be extremely low. The replicated blazed gratings were tested and demonstrated high x-ray diffraction efficiencies. This process was developed for fabricating blazed diffraction gratings for the NASA Constellation-X x-ray telescope.