CF 4 Plasma Treatment of Asymmetric Polysulfone Membranes
1996; American Chemical Society; Volume: 12; Issue: 15 Linguagem: Inglês
10.1021/la960038i
ISSN1520-5827
Autores Tópico(s)Fuel Cells and Related Materials
ResumoCF4 glow discharge treatment of asymmetric polysulfone membranes has been investigated by X-ray photoelectron spectroscopy (XPS), atomic force microscopy (AFM), and gas permeability measurements. Oxygen and nitrogen gas permeability and permselectivity through the polysulfone substrate are found to be strongly influenced by the plasma-processing parameters.
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