Boron nitride thin films on Si(100) by metal organic chemical vapour deposition
1993; Elsevier BV; Volume: 87; Issue: 1 Linguagem: Inglês
10.1016/0038-1098(93)90538-x
ISSN1879-2766
AutoresG. Sarala Devi, Sujit Roy, V. Jayathirtha Rao,
Tópico(s)Metal and Thin Film Mechanics
ResumoAbstract Crystalline boron nitride thin films have been deposited on silicon substrates by MO-CVD at different temperatures using a single source III–V precursor in N2 ambient. The deposited films are characterized by XRD and IR techniques. XRD confirms that the films are mostly polycrystalline with (111), (200), (004), (103) oriented cubic and hexagonal phases of boron nitride. IR also shows a mixture of cubic and nexagonal boron nitride phases.
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