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In-situ growth of YBCO high-Tc superconducting thin films by plasma-enhanced metalorganic chemical vapor deposition

1991; Elsevier BV; Volume: 107; Issue: 1-4 Linguagem: Inglês

10.1016/0022-0248(91)90544-f

1873-5002

Jing Zhao, C. S. Chern, Y.Q. Li, D. W. Noh, P. Norris, P. Zawadzki, B. H. Kear, B. Gallois,

Diamond and Carbon-based Materials Research

Highly c-axis oriented, highly dense, low carbon YBa2Cu3Ox superconducting thin films have been formed in-situ at a reduced substrate temperature as low as 570°C by a novel plasma enhanced metalorganic chemical vapor deposition process. Superconducting YBa2Cu3Ox thin films, having a zero resistance transition temperature of 82 K and critical current density of 104A/cm2 at 70 K have been directly deposited on sapphire substrates by such a process.