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Mechanism of photosurface deposition

1993; Elsevier BV; Volume: 164-166; Linguagem: Inglês

10.1016/0022-3093(93)91223-p

1873-4812

Tamio Kawaguchi, Shigeo Maruno, Keiji Tanaka,

Chemical and Physical Properties of Materials

To understand photosurface deposition (PSD) phenomenon, the deposition mechanism of Ag particles on Ag-rich AgAsS glasses under illumination has been investigated from a view point of electrical effects. The photo-deposited Ag particles are found to be negatively charged under illumination. PSD can effectively be suppressed by coating over the surface with semi-transparent metallic films of work function greater than 4.3 eV, which are positively charged under illumination. The Ag deposition with similar morphology as that observed in PSD can be induced by application of d.c. voltage or by irradiation of an electron beam. These observations suggest that the growth of Ag particles in PSD can be explained by a purely electrical model.