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Imaging and Patterning of Monomolecular Resists by Zone-Plate-Focused X-ray Microprobe

2003; American Chemical Society; Volume: 107; Issue: 47 Linguagem: Inglês

10.1021/jp0307396

1520-6106

Ruth Klauser, I.-H. Hong, S.-C. Wang, Michael Zharnikov, Alison Paul, Armin Gölzhäuser, Andreas Terfort, T. J. Chuang,

Force Microscopy Techniques and Applications

Soft X-ray scanning photoelectron microscopy (SPEM) was applied to image and characterize molecular patterns produced by electron irradiation of various aliphatic and aromatic thiol-derived self-assembled monolayers (SAMs). The observed chemical contrasts allowed us to monitor complex phenomena which occurred as a result of electron-beam patterning, the exposure of the patterned films to ambient, and the irradiation of the films by the X-ray microprobe during image acquisition. The latter effect has been analyzed in detail and utilized for direct lithographic writing in the SAM resists by the zone-plate-focused X-ray beam. The results demonstrate the capabilities of the SPEM technique both for chemical imaging and as a fabrication tool for micro- and nanolithography.