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Fabrication of PPF Electrodes by a Rapid Thermal Process

2010; Institute of Physics; Volume: 158; Issue: 1 Linguagem: Inglês

10.1149/1.3515169

1945-7111

F. Javier del Campo, Philippe Godignon, Leigh Aldous, E. Pausas, M. L. Martínez Sarrión, M. Zabala, Ricard Prehn, Richard G. Compton,

Analytical Chemistry and Sensors

This work describes the fabrication of pyrolyzed photoresist films (PPFs) using a rapid thermal process for the first time. A standard positive phenolic photoresist was deposited over a silicon wafer and heated in an inert atmosphere at rates in excess of up to a temperature of . An annealing step of at that temperature was required to obtain a more complete graphitization of the resist and thus improve its electrochemical response. The PPF synthesized by this rapid thermal process showed one of the lowest resistivities reported to date for this kind of material (ca. ) but was slightly rougher than the PPF synthesized using slower thermal ramps (1.6 vs ). This rapid thermal process allows the fabrication, by direct lithoghraphy, of structures down to in width. The electrochemical behavior of our PPF closely resembled glassy carbon, as shown by the voltammetry of , , , and dopamine.