An FTIR study of the mechanism for the reaction HO + CH 3 SCH 3
1983; Wiley; Volume: 15; Issue: 7 Linguagem: Inglês
10.1002/kin.550150706
ISSN1097-4601
AutoresH. Niki, P. D. Maker, C. M. Savage, L. P. Breitenbach,
Tópico(s)Industrial Gas Emission Control
ResumoAbstract Product studies were made using the Fourier transform infrared method in the uv (300–400‐nm) photolysis of mixtures containing CH 3 SCH 3 , C 2 H 5 ONO, and NO in ppm concentrations in 700 torr of O 2 –N 2 diluent. Methyl thionitrite, CH 3 SNO, arising from the reaction CH 3 S + NO, was detected as an intermediate product. In addition, the yields of the major sulfur‐containing products SO 2 and CH 3 SO 3 H coincided with those of the oxidation of the CH 3 S radicals generated directly by the photodissociation of CH 3 SNO. The formation of CH 3 S in the HO‐initiated oxidation of CH 3 SCH 3 in the presence of NO suggests a reaction scheme involving the H‐abstraction reaction HO + CH 3 SCH 3 → CH 3 SCH 2 + H 2 O as the primary step.
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