Synthesis of carbon clusters and thin films by low temperature plasma chemical vapor deposition under atmospheric pressure
1996; International Union of Pure and Applied Chemistry; Volume: 68; Issue: 5 Linguagem: Inglês
10.1351/pac199668051151
ISSN1365-3075
AutoresHideomi Koinuma, Takao Horiuchi, Kiyoto Inomata, Heon‐Cheol Ha, Kiyotaka Nakajima, Khaliq A. Chaudhary,
Tópico(s)Fullerene Chemistry and Applications
ResumoAbstract
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