Jet and flash imprint lithography for the fabrication of patterned media drives
2009; SPIE; Volume: 7488; Linguagem: Inglês
10.1117/12.833366
ISSN1996-756X
AutoresGerard M. Schmid, Cynthia B. Brooks, Zhengmao Ye, Steve Johnson, Dwayne LaBrake, S. V. Sreenivasan, Douglas J. Resnick,
Tópico(s)Fluid Dynamics and Thin Films
ResumoThe ever-growing demand for hard drives with greater storage density has motivated a technology shift from continuous magnetic media to patterned media hard disks, which are expected to be implemented in future generations of hard disk drives to provide data storage at densities exceeding 10 12 bits per square inch. Jet and Flash Imprint Lithography (J-FIL TM ) technology has been employed to pattern the hard disk substrates. This paper discusses the infrastructure required to enable J-FIL in high-volume manufacturing; namely, fabrication of master templates, template replication, high-volume imprinting with precisely controlled residual layers, dual-sided imprinting and defect inspection. Imprinting of disks is demonstrated with substrate throughput currently as high as 180 disks/hour (dual-sided). These processes are applied to patterning hard disk substrates with both discrete tracks and bit-patterned designs.
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