Artigo Revisado por pares

Preparation of Nd-Doped SiO 2 Glasses by Axial Injection Plasma Torch CVD and Their Fluorescence Properties

1984; Institute of Physics; Volume: 23; Issue: 6A Linguagem: Inglês

10.1143/jjap.23.l409

ISSN

1347-4065

Autores

Hiroshi Namikawa, Yoshiro Ishii, Ken Kumata, Kazuo Arai, Ichio Iida, Toshio Tsuchiya,

Tópico(s)

Silicon Nanostructures and Photoluminescence

Resumo

To prepare Nd-doped SiO 2 glasses by axial injection plasma torch CVD, a special type of NdCl 3 gas generator for axial injection was developed and its optimum operating conditions were examined. The technical advantages and disadvantages of this method were discussed in comparison with previously reported tail injection plasma torch CVD. Although a large difference exists between these two methods, little difference in the fluorescence properties of the resultant glasses was observed.

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