Photo–Roll Lithography (PRL) for Continuous and Scalable Patterning with Application in Flexible Electronics
2013; Volume: 25; Issue: 45 Linguagem: Inglês
10.1002/adma.201303514
ISSN1521-4095
AutoresJong G. Ok, Moon Kyu Kwak, Chad M. Huard, Hong Seok Youn, L. Jay Guo,
Tópico(s)Microfluidic and Bio-sensing Technologies
ResumoA novel nanofabrication methodology for continuous, scalable, and geometry-tunable lithography is developed, named photo–roll lithography (PRL), by integrating photolithography with rollable processing. As a flexible mask attached to a quartz cylinder containing a UV source rolls over a photoresistcoated substrate, PRL realizes continuous photolithographic fabrication of various micro/nanoscale patterns with geometry that is tunable by controlling mask–substrate motions.
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