Performance and Properties of Ultra-Thin Silicon Nitride X-ray Windows
2014; Institute of Electrical and Electronics Engineers; Volume: 61; Issue: 1 Linguagem: Inglês
10.1109/tns.2014.2298434
ISSN1558-1578
AutoresP.T. Törmä, Jari Kostamo, Heikki Sipilä, Marco Mattila, Pasi Kostamo, Esa Kostamo, Harri Lipsanen, Christian Laubis, Frank Scholze, Nick Nelms, Brian Shortt, Marcos Bavdaz,
Tópico(s)Silicon Carbide Semiconductor Technologies
ResumoThe spectral transmittance of a new generation of SiN based X-ray windows is characterized. The windows are strengthened by low aspect-ratio support grid. As expected for this unprecedented thin window material, the transmittance in the soft X-ray spectral region outperforms the present technologies. A detailed study of the various performance properties of the fabricated SiN X-ray windows is presented. Besides their high transmittance, the windows also have high uniformity, high mechanical strength and good leak tightness. The windows can withstand temperatures from cryogenic range to approximately 250°C. SiN foils are the first real nanotechnology-based choice for the practical realization of X-ray windows and bring the performance to a level that only nanotechnology can offer.
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