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IR laser photolysis of mixtures of silane with nitric oxide and acetylene

1989; Elsevier BV; Volume: 154; Issue: 3 Linguagem: Inglês

10.1016/0009-2614(89)87451-2

1873-4448

V. Di Napoli, Andrea Mele, Domenico Stranges, A. Giardini‐Guidoni, R. Teghil,

Spectroscopy and Laser Applications

Abstract The decomposition of SiH 4 , both pure and in mixtures with NO and C 2 H 2 , induced by continuous and pulsed IR laser radiation has been investigated over a wide pressure range up to high conversion. The results are discussed on the basis of the formation of ground or electronically excited SiH 2 and its subsequent reactions. Comparison with calculations of unimolecular decomposition rates based on RRKM theory provides evidence that nonequilibrium distributions of electronically excited species are responsible for observed alternative reaction paths.