Nanowear/nanomechanical testing and the role of stress in sputtered CNx overcoats
1997; American Institute of Physics; Volume: 81; Issue: 8 Linguagem: Inglês
10.1063/1.365562
ISSN1520-8850
AutoresT.W. Scharf, Heng Deng, J. A. Barnard,
Tópico(s)Boron and Carbon Nanomaterials Research
Resumoa: C–N x films were deposited on Si(111) wafers at ambient temperatures by reactive magnetron sputtering of C in a mixed Ar/N2 discharge. The hardness (H) and elastic modulus (E) were assessed via nanoindentation using a Berkovich diamond indenter. The nitrogenated films exhibited increased hardness and elastic moduli values compared to the amorphous carbonated films, i.e., 25 and 240 GPa to 16 and 160 GPa, respectively. A sphere-on-flat (magnetic tape) wear tester was used to assess wear scar volume losses as a function of wear time. All films were in a state of compression (intrinsic and thermal stress). The bonding, composition, and structure of the films for all the deposition conditions were assessed by micro-Raman spectroscopy, energy dispersive x-ray spectroscopy (EDX), and x-ray diffraction (XRD), respectively, and subsequently correlated to overall film properties.
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