Static Vapor Pressure Measurement of Low Volatility Precursors for Molecular Vapor Deposition Below Ambient Temperature
2001; Wiley; Volume: 7; Issue: 1 Linguagem: Inglês
10.1002/1521-3862(200101)7
ISSN1521-3862
AutoresT. Ohta, Fabio Cicoira, P. Doppelt, L. Beitone, P. Hoffmann,
Tópico(s)Chemical Thermodynamics and Molecular Structure
ResumoStatic vapor pressure measurements of volatile metal precursors, in the pressure range 10–1 Pa to 103 Pa, are described. The vapor pressures and the sublimation or evaporation enthalpies, in the range 265 K–300 K, of Mo(CO)6 (77.7 kJ mol–1), two dimethyl(β-diketonato)gold(III) complexes, Me2Au(tfa) (83.5 kJ mol–1) and Me2Au(hfa) (68.1 kJ mol–1), and an inorganic Rh precursor, [(PF3)2RhCl]2 (90.8 kJ mol–1), were determined. The sublimation enthalpy for Mo(CO)6 was larger by more than 10 % in the measured temperature range than reported values measured at higher temperatures. At ambient temperatures, partial decomposition was observed only for the gold precursors.
Referência(s)