Portal de Periódicos da CAPES

High-sensitivity molecular organometallic resist for EUV (MORE)

2015; SPIE; Volume: 9425; Linguagem: Inglês

10.1117/12.2086599

1996-756X

James Passarelli, Michael Murphy, Ryan Del Re, Miriam Sortland, Levi Dousharm, Michaela Vockenhuber, Yasin Ekinci, Mark Neisser, Daniel Freedman, Robert L. Brainard,

Semiconductor materials and devices

We have developed organometallic carboxylate compounds [R n M(O 2 CR') 2 ] capable of acting as negativetone EUV resists. Overall, the best and fastest resists contain antimony, are pentavalent and the carboxylate group contains a polymerizable olefin (e.g. acrylate, methacrylate or styrenecarboxylate). Evidence suggests that high sensitivity is achieved through the polymerization of olefins in the exposed region. We have performed a systematic sensitivity study of molecules of the type R n M(O 2 CR') 2 where we have studied seven R groups, four main group metals (M), and three polymerizable carboxylate groups (O 2 CR'). We found that the greatest predictor of sensitivity of the R n Sb(O 2 CR') 2 resists is their level of polymerizable olefins. We mathematically define the polymerizable olefin loading (POL) as the ratio of the number of olefins vs. the number of non-hydrogen atoms. Linear and log plots of E max vs. POL for a variety of molecules of the type R 3 Sb(O 2 CR') 2 lend insight into the behaviour of these resists.