Phase formation of NiAl3 on lateral diffusion couples
1988; American Institute of Physics; Volume: 64; Issue: 2 Linguagem: Inglês
10.1063/1.341956
ISSN1520-8850
AutoresJoyce C. Liu, J. W. Mayer, J. C. Barbour,
Tópico(s)Solidification and crystal growth phenomena
ResumoThe kinetics of NiAl3 phase growth is studied on lateral diffusion couples in the temperature range from 375 to 450 °C. The lateral diffusion couple consists of an Al-rich source on a Ni2 Al3 thin film. Analytical electron microscopy is used to determine the crystal structures and chemical compositions of the growing phases. The results show that: (1) Al is the dominant moving species in the growing NiAl3 phase; (2) an equilibrium concentration of Al is established during the growth; and (3) the growth has a parabolic dependence on the annealing time. The study of NiAl3 growth kinetics on lateral diffusion couples bridges the gap between bulk and thin-film diffusion couples in terms of reaction temperatures. The activation energy of NiAl3 growth is 1.2±0.2 eV.
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