Portal de Periódicos da CAPES

SiOx‐Based Multilayer Barrier Coatings Produced by a Single PECVD Process

2009; Wiley; Volume: 6; Issue: S1 Linguagem: Inglês

10.1002/ppap.200931703

1612-8869

Alessandro Patelli, Simone Vezzù, Lorenzo Zottarel, Enrico Menin, C. Sada, Alessandro Martucci, Stefano Costacurta,

Organic Light-Emitting Diodes Research

Abstract Multilayer organic/inorganic gas barrier coatings on plastics are needed for high performance demanding applications from OLEDs to packaging. In order to simplify the multilayer deposition process, we developed a single step vacuum process where silicon oxide‐based PECVD multilayers are obtained by the modulation of the hexamethyldisiloxane (HMDSO) precursor inlet and interfaces are controlled by pumping speed. In this way, depending on O 2 /HMDSO ratio, ‘ceramic’ or ‘polymeric’ layers are deposited, with nanometre control of thickness of layers and interfaces. Permeability behaviour of the multilayer structures obtained is described as a function of the number of layers and their thickness.