Structural and optical properties of plasma-deposited boron nitride films
1986; Elsevier BV; Volume: 140; Issue: 2 Linguagem: Inglês
10.1016/0040-6090(86)90263-4
ISSN1879-2731
AutoresT.H. Yuzuriha, Dennis W. Hess,
Tópico(s)Metal and Thin Film Mechanics
ResumoThe plasma-enhanced chemical vapor deposition of boron nitride films in a low pressure, parallel plate reactor incorporating an electromagnet was investigated. Films were deposited from gas mixtures of diborane, hydrogen and ammonia. The ratio of boron to nitrogen was approximately 1.7 when an ammonia-to-diborane ratio of 4 was used. The films had the following optical properties: a band gap in the range 5.6–5.8 eV, an absorption coefficient (at 6.0 eV) of about 1×105 cm−1 and an index of refraction of 1.7. In general the optical properties were identical, with or without the application of a low intensity magnetic field.
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