Gas source molecular beam epitaxy growth of short period GaP/AlP(001) superlattices
1991; American Institute of Physics; Volume: 58; Issue: 13 Linguagem: Inglês
10.1063/1.105207
ISSN1520-8842
AutoresH. Asahi, Kumiko Asami, Tetsuya Watanabe, Soon Jae Yu, Tadaaki Kaneko, Shūichi Emura, Shun‐ichi Gonda,
Tópico(s)Advanced Semiconductor Detectors and Materials
ResumoShort period GaP/AlP superlattices are grown on GaP and GaAs substrates at 600 °C by gas source molecular beam epitaxy with growth interruption. Alternating monolayer growth of GaP and AlP is confirmed by the observation of the reflection high-energy electron diffraction intensity oscillations during growth. The formation of short period superlattice structures and the zone-folded LO phonons are observed in the x-ray diffraction rocking curves and Raman spectra, respectively.
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