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Advanced applications in microphotonics using proton beam writing

2009; Elsevier BV; Volume: 267; Issue: 12-13 Linguagem: Inglês

10.1016/j.nimb.2009.03.035

1872-9584

Andrew A. Bettiol, Sher-Yi Chiam, Ee Jin Teo, C.N.B. Udalagama, S.F. Chan, Siew‐Kit Hoi, J.A. van Kan, Mark B. H. Breese, F. Watt,

Ion-surface interactions and analysis

Proton beam writing (PBW) is a powerful tool for prototyping microphotonic structures in a wide variety of materials including polymers, insulators, semiconductors and metals. Prototyping is achieved either through direct fabrication with the proton beam, or by the fabrication of a master that can be used for replication. In recent times we have explored the use of PBW for various advanced optical applications including fabrication of subwavelength metallic structures and metamaterials, direct write of silicon waveguides for mid IR applications and integrated waveguides for lab-on-a-chip devices. This paper will review the recent progress made in these areas with particular emphasis on the main advantages of using the PBW technique for these novel applications.