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First lithographic results from the extreme ultraviolet Engineering Test Stand

2001; American Institute of Physics; Volume: 19; Issue: 6 Linguagem: Inglês

10.1116/1.1414017

1520-8567

Henry N. Chapman, Avijit K. Ray-Chaudhuri, Daniel A. Tichenor, William C. Replogle, R. H. Stulen, Glenn D. Kubiak, Paul D. Rockett, Leonard E. Klebanoff, Deborah O’Connell, Alvin H. Leung, Karen L. Jefferson, John B. Wronosky, John S. Taylor, Layton C. Hale, Kenneth L. Blaedel, Eberhard Spiller, Gary E. Sommargren, James A. Folta, Donald W. Sweeney, Eric M. Gullikson, Patrick Naulleau, Kenneth A. Goldberg, Jeffrey Bokor, David Attwood, Uwe Mickan, Ralph M. Hanzen, Eric M. Panning, P.-Y. Yan, C. W. Gwyn, S. H. Lee,

Advanced optical system design

The extreme ultraviolet (EUV) Engineering Test Stand (ETS) is a step-and-scan lithography tool that operates at a wavelength of 13.4 nm. It has been developed to demonstrate full-field EUV imaging and acquire system learning for equipment manufacturers to develop commercial tools. The initial integration of the tool is being carried out using a developmental set of projection optics, while a second, higher-quality, projection optics is being assembled and characterized in a parallel effort. We present here the first lithographic results from the ETS, which include both static and scanned resist images of 100 nm dense and isolated features throughout the ring field of the projection optics. Accurate lithographic models have been developed and compared with the experimental results.