Fabrication of micrometer-scale structures on GaAs and GaAs/AlGaAs quantum well material using microcontact printing
1996; IOP Publishing; Volume: 7; Issue: 3 Linguagem: Inglês
10.1088/0957-4484/7/3/016
ISSN1361-6528
AutoresE Kim, George M. Whitesides, M. B. Freiler, Michael Y. Levy, Jianyao Lin, R. M. Osgood,
Tópico(s)Surface Roughness and Optical Measurements
ResumoMicrocontact printing (CP) was used in conjunction with self-assembled monolayers (SAMs) of hexadecanethiolates to fabricate gold etch masks on GaAs and GaAs/AlGaAs quantum-well substrates; patterns in the mask were transferred into the semiconductor with an anisotropic dry chemical-etch process. The measured luminescence efficiency of the etched features in GaAs/AlGaAs was similar to that of samples patterned using conventional lithography; this observation indicates that no mechanical or chemical damage is incurred in the CP process.
Referência(s)